Pixelated source mask optimization for process robustness in optical lithography.

Optics express

PubMedID: 21996879

Jia N, Lam EY. Pixelated source mask optimization for process robustness in optical lithography. Opt Express. 2011;19(20):19384-98.
Optical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the mask for higher resolution imaging. In this paper, we develop a pixelated SMO using inverse imaging, and incorporate the statistical variations explicitly in an optimization framework. Simulation results demonstrate its efficacy in process robustness enhancement.